晚上福利在线观看

Rita Mullins Wins Best Poster Presentation at the 19th International Conference on Atomic Layer Deposition

26 Jul 2019

School of Chemistry PhD student Rita Mullins won a 'Best Poster Presentation' prize at the AVS 19th International Conference on Atomic Layer Deposition (ALD 2019).

ALD 2019 took place this week, July 21-24, in Bellevue, Washington, USA. ALD 2019, featuring the 6th International Atomic Layer Etching Workshop (ALE 2019), is a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.

Rita, a B.Sc. Chemical Physics graduate, carries out her PhD research in the  under the supervision of . Her winning poster at ALD 2019 was entitled "A Mechanistic Study of the HF Pulse in the Thermal Atomic Layer Etch of HfO2 and ZrO2".